Silicon-germanium films deposited by low-frequency plasma-enhanced chemical vapor deposition: Effect of H~2 and Ar dilution: Fid-Bau Portal

Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

Silicon-germanium films deposited by low-frequency plasma-enhanced chemical vapor deposition: Effect of H~2 and Ar dilution

Kosarev, A. / Torres, A. / Hernandez, Y. / Ambrosio, R. / Zuniga, C. / Felter, T. E. / Asomoza, R. / Kudriavtsev, Y. / Silva-Gonzalez, R. / Gomez-Barojas, E.

Access

Check availability in my library

Order at Subito €

Page navigation

Document information

Export, share and cite

Silicon-germanium films deposited by low-frequency plasma-enhanced chemical vapor deposition: Effect of H~2 and Ar dilution

Kosarev, A. / Torres, A. / Hernandez, Y. / Ambrosio, R. / Zuniga, C. / Felter, T. E. / Asomoza, R. / Kudriavtsev, Y. / Silva-Gonzalez, R. / Gomez-Barojas, E.

Silicon-germanium films deposited by low-frequency plasma-enhanced chemical vapor deposition: Effect of H~2 and Ar dilution

Kosarev, A. / Torres, A. / Hernandez, Y. / Ambrosio, R. / Zuniga, C. / Felter, T. E. / Asomoza, R. / Kudriavtsev, Y. / Silva-Gonzalez, R. / Gomez-Barojas, E.

Access

Check availability in my library

Order at Subito €

Page navigation

Document information

Export, share and cite

Document information

Title:

Silicon-germanium films deposited by low-frequency plasma-enhanced chemical vapor deposition: Effect of H~2 and Ar dilution

Contributors:

Kosarev, A. (author) / Torres, A. (author) / Hernandez, Y. (author) / Ambrosio, R. (author) / Zuniga, C. (author) / Felter, T. E. (author) / Asomoza, R. (author) / Kudriavtsev, Y. (author) / Silva-Gonzalez, R. (author) / Gomez-Barojas, E. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 21 ; 88-104

Publication date:

2006-01-01

Size:

17 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

Similar titles

Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Mukhopadhyay, S. / Ray, S. | British Library Online Contents | 2011

Effect of H2 dilution on a-CN:H films deposited by hot-wire chemical vapor deposition

Swain, B. P. / Swain, B. S. / Hwang, N. M. | British Library Online Contents | 2009

Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films

Bose, M. / Basa, D. K. / Bose, D. N. | British Library Online Contents | 2001

Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films

Pham, H. T. M. / Akkaya, T. / de Boer, C. R. et al. | British Library Online Contents | 2003

Effect of in situ boron doping on properties of silicon germanium films deposited by chemical vapor deposition at 400^oC

Sedky, S. / Witvrouw, A. / Saerens, A. et al. | British Library Online Contents | 2001