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Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films

Bose, M. / Basa, D. K. / Bose, D. N.

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Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films

Bose, M. / Basa, D. K. / Bose, D. N.

Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films

Bose, M. / Basa, D. K. / Bose, D. N.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films

Contributors:

Bose, M. (author) / Basa, D. K. (author) / Bose, D. N. (author)

Published in:

MATERIALS LETTERS ; 48 ; 336-341

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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