Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties: Fid-Bau Portal

Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Mukhopadhyay, S. / Ray, S.

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Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Mukhopadhyay, S. / Ray, S.

Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Mukhopadhyay, S. / Ray, S.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Contributors:

Mukhopadhyay, S. (author) / Ray, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 9717-9723

Publication date:

2011-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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