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A Suspending Abrasives and Porous Pad Model for the Analysis of Lubrication in Chemical Mechanical Polishing
A Suspending Abrasives and Porous Pad Model for the Analysis of Lubrication in Chemical Mechanical Polishing
A Suspending Abrasives and Porous Pad Model for the Analysis of Lubrication in Chemical Mechanical Polishing
Liu, J. Y. (author) / Guo, D. M. (author) / Jin, Z. J. (author) / Kang, R. K. (author) / Yuan, Z. / Xu, X. / Zuo, D. / Yuan, J. / Yao, Y.
2006-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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