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    Quantitative analysis of surface contaminants on silicon wafers by means of TOF-SIMS

    New search for: Rostam-Khani, P.
    New search for: Philipsen, J.
    New search for: Jansen, E.
    New search for: Eberhard, H.
    New search for: Vullings, P.

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    Quantitative analysis of surface contaminants on silicon wafers by means of TOF-SIMS

    New search for: Rostam-Khani, P.
    New search for: Philipsen, J.
    New search for: Jansen, E.
    New search for: Eberhard, H.
    New search for: Vullings, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Quantitative analysis of surface contaminants on silicon wafers by means of TOF-SIMS

    New search for: Rostam-Khani, P.
    New search for: Philipsen, J.
    New search for: Jansen, E.
    New search for: Eberhard, H.
    New search for: Vullings, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Quantitative analysis of surface contaminants on silicon wafers by means of TOF-SIMS

    Contributors:

    Rostam-Khani, P. (author) / Philipsen, J. (author) / Jansen, E. (author) / Eberhard, H. (author) / Vullings, P. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 7255-7257

    Publication date:

    2006-01-01

    Size:

    3 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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