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    Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS, ICP-MS, and TXRF

    New search for: Rostam-Khani, P.
    New search for: Hopstaken, M. J. P.
    New search for: Vullings, P.
    New search for: Noij, G.
    New search for: O Halloran, O.
    New search for: Claassen, W.

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    Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS, ICP-MS, and TXRF

    New search for: Rostam-Khani, P.
    New search for: Hopstaken, M. J. P.
    New search for: Vullings, P.
    New search for: Noij, G.
    New search for: O Halloran, O.
    New search for: Claassen, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS, ICP-MS, and TXRF

    New search for: Rostam-Khani, P.
    New search for: Hopstaken, M. J. P.
    New search for: Vullings, P.
    New search for: Noij, G.
    New search for: O Halloran, O.
    New search for: Claassen, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS, ICP-MS, and TXRF

    Contributors:

    Rostam-Khani, P. (author) / Hopstaken, M. J. P. (author) / Vullings, P. (author) / Noij, G. (author) / O Halloran, O. (author) / Claassen, W. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 231/232 ; 720-724

    Publication date:

    2004-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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