A platform for research: civil engineering, architecture and urbanism
Simultaneous optical measurement of Ge-content and carbon doping in strained epitaxial SiGe films
Simultaneous optical measurement of Ge-content and carbon doping in strained epitaxial SiGe films
Simultaneous optical measurement of Ge-content and carbon doping in strained epitaxial SiGe films
Morris, S. (author) / Le Cunff, D. (author) / Ristoiu, D. (author) / Vachellerie, V. (author) / Deleglise, F. (author) / Dutartre, D. (author)
APPLIED SURFACE SCIENCE ; 253 ; 167-172
2006-01-01
6 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2004
|British Library Online Contents | 2005
|Selective epitaxial growth of SiGe for strained Si transistors
British Library Online Contents | 2006
|Selective epitaxial growth of strained SiGe/Si for optoelectronic devices
British Library Online Contents | 1998
|Optical anisotropies in strained Si/SiGe systems
British Library Online Contents | 1996
|