Inductively coupled plasma etching of GaAs in Cl2/Ar, Cl2/Ar/O2 chemistries with photoresist mask: Fid-Bau Portal

Inductively coupled plasma etching of GaAs in Cl2/Ar, Cl2/Ar/O2 chemistries with photoresist mask

Liu, K. / Ren, X. m. / Huang, Y. q. / Cai, S. w. / Duan, X. f. / Wang, Q. / Kang, C. / Li, J. s. / Chen, Q. t. / Fei, J. r.

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Inductively coupled plasma etching of GaAs in Cl2/Ar, Cl2/Ar/O2 chemistries with photoresist mask

Liu, K. / Ren, X. m. / Huang, Y. q. / Cai, S. w. / Duan, X. f. / Wang, Q. / Kang, C. / Li, J. s. / Chen, Q. t. / Fei, J. r.

Inductively coupled plasma etching of GaAs in Cl2/Ar, Cl2/Ar/O2 chemistries with photoresist mask

Liu, K. / Ren, X. m. / Huang, Y. q. / Cai, S. w. / Duan, X. f. / Wang, Q. / Kang, C. / Li, J. s. / Chen, Q. t. / Fei, J. r.

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Title:

Inductively coupled plasma etching of GaAs in Cl2/Ar, Cl2/Ar/O2 chemistries with photoresist mask

Contributors:

Liu, K. (author) / Ren, X. m. (author) / Huang, Y. q. (author) / Cai, S. w. (author) / Duan, X. f. (author) / Wang, Q. (author) / Kang, C. (author) / Li, J. s. (author) / Chen, Q. t. (author) / Fei, J. r. (author)

Published in:

APPLIED SURFACE SCIENCE ; 356 ; 776-779

Publication date:

2015-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Liu, Kai / Ren, Xiao-min / Huang, Yong-qing et al. | British Library Online Contents | 2015

Inductively coupled plasma etching of III-V semiconductors in BCl"3-based chemistries - I. GaAs, GaN, GaP, GaSb and AlGaAs

Maeda, T. / Lee, J.W. / Shul, R.J. et al. | British Library Online Contents | 1999

Comparison of ICl- and IBr-based plasma chemistries for inductively coupled plasma etching of GaN, InN and AlN

Hahn, Y.B. / Hays, D.C. / Cho, H. et al. | British Library Online Contents | 1999

High selectivity Inductively Coupled Plasma etching of GaAs over InGaP

Hays, D. C. / Cho, H. / Lee, J. W. et al. | British Library Online Contents | 2000

Inductively coupled plasma etching of III-V semiconductors in BCl"3-based chemistries - II. InP, InGaAs, InGaAsP, InAs and AlInAs

Maeda, T. / Lee, J.W. / Shul, R.J. et al. | British Library Online Contents | 1999