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    Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

    New search for: Ali, A. M.
    New search for: Inokuma, T.
    New search for: Hasegawa, S.

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    Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

    New search for: Ali, A. M.
    New search for: Inokuma, T.
    New search for: Hasegawa, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

    New search for: Ali, A. M.
    New search for: Inokuma, T.
    New search for: Hasegawa, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

    Contributors:

    Ali, A. M. (author) / Inokuma, T. (author) / Hasegawa, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 1198-1204

    Publication date:

    2006-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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