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Ion Implanted p^+/n Diodes: Post-Implantation Annealing in a Silane Ambient in a Cold-Wall Low-Pressure CVD Reactor
Ion Implanted p^+/n Diodes: Post-Implantation Annealing in a Silane Ambient in a Cold-Wall Low-Pressure CVD Reactor
Ion Implanted p^+/n Diodes: Post-Implantation Annealing in a Silane Ambient in a Cold-Wall Low-Pressure CVD Reactor
Bergamini, F. (author) / Rao, S. P. (author) / Poggi, A. (author) / Tamarri, F. (author) / Saddow, S. E. (author) / Nipoti, R. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
2006-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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