Electrical property of HfOxNy-HfO2-HfOxNy sandwich-stack films: Fid-Bau Portal

Electrical property of HfOxNy-HfO2-HfOxNy sandwich-stack films

Jiang, R. / Xie, E. / Chen, Z. / Zhang, Z.

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Electrical property of HfOxNy-HfO2-HfOxNy sandwich-stack films

Jiang, R. / Xie, E. / Chen, Z. / Zhang, Z.

Electrical property of HfOxNy-HfO2-HfOxNy sandwich-stack films

Jiang, R. / Xie, E. / Chen, Z. / Zhang, Z.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Electrical property of HfOxNy-HfO2-HfOxNy sandwich-stack films

Contributors:

Jiang, R. (author) / Xie, E. (author) / Chen, Z. (author) / Zhang, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 2421-2424

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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