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    Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

    New search for: Lee, Y. B.
    New search for: Oh, I. K.
    New search for: Cho, E. N.
    New search for: Moon, P.
    New search for: Kim, H.
    New search for: Yun, I.

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    Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

    New search for: Lee, Y. B.
    New search for: Oh, I. K.
    New search for: Cho, E. N.
    New search for: Moon, P.
    New search for: Kim, H.
    New search for: Yun, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

    New search for: Lee, Y. B.
    New search for: Oh, I. K.
    New search for: Cho, E. N.
    New search for: Moon, P.
    New search for: Kim, H.
    New search for: Yun, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

    Contributors:

    Lee, Y. B. (author) / Oh, I. K. (author) / Cho, E. N. (author) / Moon, P. (author) / Kim, H. (author) / Yun, I. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 349 ; 757-762

    Publication date:

    2015-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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