Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Numerical analysis and simulation of Czochralski growth processes for large diameter silicon crystals

    New search for: Tu, H.
    New search for: Xiao, Q.
    New search for: Gao, Y.
    New search for: Zhou, Q.
    New search for: Zhang, G.
    New search for: Chang, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Numerical analysis and simulation of Czochralski growth processes for large diameter silicon crystals

    New search for: Tu, H.
    New search for: Xiao, Q.
    New search for: Gao, Y.
    New search for: Zhou, Q.
    New search for: Zhang, G.
    New search for: Chang, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Numerical analysis and simulation of Czochralski growth processes for large diameter silicon crystals

    New search for: Tu, H.
    New search for: Xiao, Q.
    New search for: Gao, Y.
    New search for: Zhou, Q.
    New search for: Zhang, G.
    New search for: Chang, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Numerical analysis and simulation of Czochralski growth processes for large diameter silicon crystals

    Contributors:

    Tu, H. (author) / Xiao, Q. (author) / Gao, Y. (author) / Zhou, Q. (author) / Zhang, G. (author) / Chang, Q. (author)

    Published in:

    RARE METALS -BEIJING- ENGLISH EDITION ; 26 ; 521-527

    Publication date:

    2007-01-01

    Size:

    7 pages

    ISSN:

    1001-0521

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  669

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Numerical simulation for silicon crystal growth of up to 400 mm diameter in Czochralski furnaces

    Takano, K. / Shiraishi, Y. / Iida, T. et al. | British Library Online Contents | 2000

    Morphology of Oxide Precipitates in Czochralski Silicon Crystals

    Sueoka, K. / Ikeda, N. / Yamamoto, T. et al. | British Library Online Contents | 1993

    Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers

    Depuydt, B. / Theuwis, A. / Romandic, I. | British Library Online Contents | 2006

    Oxygen transportation during Czochralski silicon crystal growth

    Hoshikawa, K. / Huang, X. | British Library Online Contents | 2000

    Czochralski growth of Te-doped GaSb single crystals

    Stepanek, B. / Sestakova, V. / Sestak, J. | British Library Online Contents | 1993

    Back to top