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    Analytical modeling of reservoir effect on electromigration in Cu interconnects

    New search for: Gan, Z.
    New search for: Gusak, A. M.
    New search for: Shao, W.
    New search for: Chen, Z.
    New search for: Mhaisalkar, S. G.
    New search for: Zaporozhets, T.
    New search for: Tu, K. N.

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    Analytical modeling of reservoir effect on electromigration in Cu interconnects

    New search for: Gan, Z.
    New search for: Gusak, A. M.
    New search for: Shao, W.
    New search for: Chen, Z.
    New search for: Mhaisalkar, S. G.
    New search for: Zaporozhets, T.
    New search for: Tu, K. N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Analytical modeling of reservoir effect on electromigration in Cu interconnects

    New search for: Gan, Z.
    New search for: Gusak, A. M.
    New search for: Shao, W.
    New search for: Chen, Z.
    New search for: Mhaisalkar, S. G.
    New search for: Zaporozhets, T.
    New search for: Tu, K. N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Analytical modeling of reservoir effect on electromigration in Cu interconnects

    Contributors:

    Gan, Z. (author) / Gusak, A. M. (author) / Shao, W. (author) / Chen, Z. (author) / Mhaisalkar, S. G. (author) / Zaporozhets, T. (author) / Tu, K. N. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 22 ; 152-156

    Publication date:

    2007-01-01

    Size:

    5 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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