Low Dielectric Constant Materials for ULSI Interconnects

Morgen, M. / Ryan, E. T. / Zhao, J.-H. et al. | British Library Online Contents | 2000

Electromigration and IC Interconnects

Thompson, C. V. / Lloyd, J. R. | British Library Online Contents | 1993

Challenges of electromigration - Electromigration degradation mechanisms in copper dual-inlaid interconnects -

Zschech, E. / Meyer, M. A. / Grafe, M. et al. | British Library Online Contents | 2004

Analysis and Study on CMP of Copper Interconnects for ULSI

Wang, X. / Yu, G. / Liu, Y.-l. | British Library Online Contents | 2002

Growth of electromigration-induced hillocks in Al interconnects

Nucci, J. A. / Straub, A. / Bischoff, E. et al. | British Library Online Contents | 2002