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Analysis of the Electrical Activation of P^+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
Analysis of the Electrical Activation of P^+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
Analysis of the Electrical Activation of P^+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
Canino, M. (author) / Giannazzo, F. (author) / Roccaforte, F. (author) / Poggi, A. (author) / Solmi, S. (author) / Raineri, V. (author) / Nipoti, R. (author) / Wright, N. / Johnson, C. M. / Vassilevski, K.
2007-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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