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Analysis of the Electrical Activation of P^+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
Analysis of the Electrical Activation of P^+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
Analysis of the Electrical Activation of P^+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
Canino, M. (Autor:in) / Giannazzo, F. (Autor:in) / Roccaforte, F. (Autor:in) / Poggi, A. (Autor:in) / Solmi, S. (Autor:in) / Raineri, V. (Autor:in) / Nipoti, R. (Autor:in) / Wright, N. / Johnson, C. M. / Vassilevski, K.
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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