Electrical Properties of Atomic-Layer-Deposited La~2O~3/Thermal-Nitrided SiO~2 Stacking Dielectric on 4H-SiC(0001): Fid-Bau Portal

Electrical Properties of Atomic-Layer-Deposited La~2O~3/Thermal-Nitrided SiO~2 Stacking Dielectric on 4H-SiC(0001)

Moon, J. H. / Cheong, K. Y. / Eom, D. I. / Song, H. K. / Yim, J. H. / Lee, J. H. / Na, H. J. / Bahng, W. / Kim, N. K. / Kim, H. J.

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Electrical Properties of Atomic-Layer-Deposited La~2O~3/Thermal-Nitrided SiO~2 Stacking Dielectric on 4H-SiC(0001)

Moon, J. H. / Cheong, K. Y. / Eom, D. I. / Song, H. K. / Yim, J. H. / Lee, J. H. / Na, H. J. / Bahng, W. / Kim, N. K. / Kim, H. J.

Electrical Properties of Atomic-Layer-Deposited La~2O~3/Thermal-Nitrided SiO~2 Stacking Dielectric on 4H-SiC(0001)

Moon, J. H. / Cheong, K. Y. / Eom, D. I. / Song, H. K. / Yim, J. H. / Lee, J. H. / Na, H. J. / Bahng, W. / Kim, N. K. / Kim, H. J.

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Title:

Electrical Properties of Atomic-Layer-Deposited La~2O~3/Thermal-Nitrided SiO~2 Stacking Dielectric on 4H-SiC(0001)

Contributors:

Moon, J. H. (author) / Cheong, K. Y. (author) / Eom, D. I. (author) / Song, H. K. (author) / Yim, J. H. (author) / Lee, J. H. (author) / Na, H. J. (author) / Bahng, W. (author) / Kim, N. K. (author) / Kim, H. J. (author)

Published in:

Silicon Carbide and Related Materials 2006 ; 643-646

MATERIALS SCIENCE FORUM ; 556/557

Publication date:

2007-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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