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Nanoimprint Lithography Based Approach for the Fabrication of Large-Area, Uniformly-Oriented Plasmonic Arrays
Nanoimprint Lithography Based Approach for the Fabrication of Large-Area, Uniformly-Oriented Plasmonic Arrays
Nanoimprint Lithography Based Approach for the Fabrication of Large-Area, Uniformly-Oriented Plasmonic Arrays
Lucas, B. D. (author) / Kim, J. S. (author) / Chin, C. (author) / Guo, L. J. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 20 ; 1129-1134
2008-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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