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Chlorine based focused electron beam induced etching: A novel way to pattern germanium

Shawrav, M.M. / Gökdeniz, Z.G. / Wanzenboeck, H.D. / Taus, P. / Mika, J.K. / Waid, S. / Bertagnolli, E.

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Chlorine based focused electron beam induced etching: A novel way to pattern germanium

Shawrav, M.M. / Gökdeniz, Z.G. / Wanzenboeck, H.D. / Taus, P. / Mika, J.K. / Waid, S. / Bertagnolli, E.

Chlorine based focused electron beam induced etching: A novel way to pattern germanium

Shawrav, M.M. / Gökdeniz, Z.G. / Wanzenboeck, H.D. / Taus, P. / Mika, J.K. / Waid, S. / Bertagnolli, E.

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Document information

Title:

Chlorine based focused electron beam induced etching: A novel way to pattern germanium

Contributors:

Shawrav, M.M. (author) / Gökdeniz, Z.G. (author) / Wanzenboeck, H.D. (author) / Taus, P. (author) / Mika, J.K. (author) / Waid, S. (author) / Bertagnolli, E. (author)

Published in:

Materials science in semiconductor processing ; 42 ; 170-173

Publication date:

2016-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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