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    Laser Annealing of Implanted Semiconductor Layers - One Bridge to Nano-Processing

    New search for: Geiler, H.D.
    New search for: Lerch, W.
    New search for: Niess, J.

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    Laser Annealing of Implanted Semiconductor Layers - One Bridge to Nano-Processing

    New search for: Geiler, H.D.
    New search for: Lerch, W.
    New search for: Niess, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Laser Annealing of Implanted Semiconductor Layers - One Bridge to Nano-Processing

    New search for: Geiler, H.D.
    New search for: Lerch, W.
    New search for: Niess, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Export, share and cite

    Document information
    Title:

    Laser Annealing of Implanted Semiconductor Layers - One Bridge to Nano-Processing

    Contributors:

    Geiler, H.D. (author) / Lerch, W. / Niess, J.

    Published in:

    Rapid Thermal Processing and beyond: Applications in Semiconductor Processing ; 237-256

    MATERIALS SCIENCE FORUM ; 573/574

    Publication date:

    2008-01-01

    Size:

    20 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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