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    Secondary ion species containing nitrogen atoms from plasma-enhanced chemical vapor deposited silicon oxide films on silicon

    New search for: Chiba, K.
    New search for: Tsuji, Y.

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    Secondary ion species containing nitrogen atoms from plasma-enhanced chemical vapor deposited silicon oxide films on silicon

    New search for: Chiba, K.
    New search for: Tsuji, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Secondary ion species containing nitrogen atoms from plasma-enhanced chemical vapor deposited silicon oxide films on silicon

    New search for: Chiba, K.
    New search for: Tsuji, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Secondary ion species containing nitrogen atoms from plasma-enhanced chemical vapor deposited silicon oxide films on silicon

    Contributors:

    Chiba, K. (author) / Tsuji, Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 254 ; 5727-5731

    Publication date:

    2008-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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