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Band bending measurement of HfO2/SiO2/Si capacitor with ultra-thin La2O3 insertion by XPS
Band bending measurement of HfO2/SiO2/Si capacitor with ultra-thin La2O3 insertion by XPS
Band bending measurement of HfO2/SiO2/Si capacitor with ultra-thin La2O3 insertion by XPS
Kakushima, K. (author) / Okamoto, K. (author) / Adachi, M. (author) / Tachi, K. (author) / Song, J. (author) / Sato, S. (author) / Kawanago, T. (author) / Ahmet, P. (author) / Tsutsui, K. (author) / Sugii, N. (author)
APPLIED SURFACE SCIENCE ; 254 ; 6106-6108
2008-01-01
3 pages
Article (Journal)
English
DDC:
621.35
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