A platform for research: civil engineering, architecture and urbanism
Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90nm node MOSFETs
Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90nm node MOSFETs
Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90nm node MOSFETs
Chen, H. W. (author) / Chen, S. Y. (author) / Chen, K. C. (author) / Huang, H. S. (author) / Liu, C. H. (author) / Chiu, F. C. (author) / Liu, K. W. (author) / Lin, K. C. (author) / Cheng, L. W. (author) / Lin, C. T. (author)
APPLIED SURFACE SCIENCE ; 254 ; 6127-6130
2008-01-01
4 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Study of hot-carrier-induced photon emission from 90nm Si MOSFETs
British Library Online Contents | 2005
|British Library Online Contents | 2009
|Electrical characterization of MFeOS gate stacks for ferroelectric FETs
British Library Online Contents | 2013
|Electrical characterization of high-k gate dielectrics on semiconductors
British Library Online Contents | 2008
|Materials Characterization of Alternative Gate Dielectrics
British Library Online Contents | 2002
|