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Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry
Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry
Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry
Ishizaki, Y. (author) / Yamamoto, T. (author) / Fujii, M. (author) / Owari, M. (author) / Nojima, M. (author) / Nihei, Y. (author)
APPLIED SURFACE SCIENCE ; 255 ; 1351-1353
2008-01-01
3 pages
Article (Journal)
English
DDC:
621.35
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