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    Quantification of SiGe layer composition using MCs+ and MCs2+ secondary ions in ToF-SIMS and magnetic SIMS

    New search for: Marseilhan, D.
    New search for: Barnes, J. P.
    New search for: Fillot, F.
    New search for: Hartmann, J. M.
    New search for: Holliger, P.

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    Quantification of SiGe layer composition using MCs+ and MCs2+ secondary ions in ToF-SIMS and magnetic SIMS

    New search for: Marseilhan, D.
    New search for: Barnes, J. P.
    New search for: Fillot, F.
    New search for: Hartmann, J. M.
    New search for: Holliger, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Quantification of SiGe layer composition using MCs+ and MCs2+ secondary ions in ToF-SIMS and magnetic SIMS

    New search for: Marseilhan, D.
    New search for: Barnes, J. P.
    New search for: Fillot, F.
    New search for: Hartmann, J. M.
    New search for: Holliger, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Quantification of SiGe layer composition using MCs+ and MCs2+ secondary ions in ToF-SIMS and magnetic SIMS

    Contributors:

    Marseilhan, D. (author) / Barnes, J. P. (author) / Fillot, F. (author) / Hartmann, J. M. (author) / Holliger, P. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 255 ; 1412-1414

    Publication date:

    2008-01-01

    Size:

    3 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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