Characterization of Mo-Al-N nanocrystalline films synthesized by reactive magnetron sputtering: Fid-Bau Portal

Characterization of Mo-Al-N nanocrystalline films synthesized by reactive magnetron sputtering

Yang, J. F. / Yuan, Z. G. / Liu, Q. / Wang, X. P. / Fang, Q. F.

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Characterization of Mo-Al-N nanocrystalline films synthesized by reactive magnetron sputtering

Yang, J. F. / Yuan, Z. G. / Liu, Q. / Wang, X. P. / Fang, Q. F.

Characterization of Mo-Al-N nanocrystalline films synthesized by reactive magnetron sputtering

Yang, J. F. / Yuan, Z. G. / Liu, Q. / Wang, X. P. / Fang, Q. F.

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Check availability in my library

Order at Subito €

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Document information

Title:

Characterization of Mo-Al-N nanocrystalline films synthesized by reactive magnetron sputtering

Contributors:

Yang, J. F. (author) / Yuan, Z. G. (author) / Liu, Q. (author) / Wang, X. P. (author) / Fang, Q. F. (author)

Published in:

MATERIALS RESEARCH BULLETIN ; 44 ; 86-90

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0025-5408

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11 / 620

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