On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition: Fid-Bau Portal

On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

van Hattum, E. D. / Boltje, D. B. / Palmero, A. / Arnoldbik, W. M. / Rudolph, H. / Habraken, F. H.

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On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

van Hattum, E. D. / Boltje, D. B. / Palmero, A. / Arnoldbik, W. M. / Rudolph, H. / Habraken, F. H.

On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

van Hattum, E. D. / Boltje, D. B. / Palmero, A. / Arnoldbik, W. M. / Rudolph, H. / Habraken, F. H.

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Title:

On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

Contributors:

van Hattum, E. D. (author) / Boltje, D. B. (author) / Palmero, A. (author) / Arnoldbik, W. M. (author) / Rudolph, H. (author) / Habraken, F. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 3079-3084

Publication date:

2008-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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