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Dopant enhanced H diffusion in amorphous silicon and its effect on the kinetics of solid phase epitaxy

Johnson, B. C. / Caradonna, P. / McCallum, J. C.

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Dopant enhanced H diffusion in amorphous silicon and its effect on the kinetics of solid phase epitaxy

Johnson, B. C. / Caradonna, P. / McCallum, J. C.

Dopant enhanced H diffusion in amorphous silicon and its effect on the kinetics of solid phase epitaxy

Johnson, B. C. / Caradonna, P. / McCallum, J. C.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Dopant enhanced H diffusion in amorphous silicon and its effect on the kinetics of solid phase epitaxy

Contributors:

Johnson, B. C. (author) / Caradonna, P. (author) / McCallum, J. C. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 157 ; 6-10

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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