Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions: Fid-Bau Portal

Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions

Rusnak, J. / Ruzinsky, M. / Imamura, K. / Matsumoto, T. / Stefecka, M. / Takahashi, M. / Kobayashi, H. / Pincik, E.

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Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions

Rusnak, J. / Ruzinsky, M. / Imamura, K. / Matsumoto, T. / Stefecka, M. / Takahashi, M. / Kobayashi, H. / Pincik, E.

Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions

Rusnak, J. / Ruzinsky, M. / Imamura, K. / Matsumoto, T. / Stefecka, M. / Takahashi, M. / Kobayashi, H. / Pincik, E.

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Title:

Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions

Contributors:

Rusnak, J. (author) / Ruzinsky, M. (author) / Imamura, K. (author) / Matsumoto, T. (author) / Stefecka, M. (author) / Takahashi, M. (author) / Kobayashi, H. (author) / Pincik, E. (author) / Gabouze, N.

Published in:

Thin Films and Porous Materials ; 123-128

MATERIALS SCIENCE FORUM ; 609

Publication date:

2009-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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