A platform for research: civil engineering, architecture and urbanism
Experimental Investigations on Material Removal Rate and Surface Roughness in Lapping of Substrate Wafers: A Literature Review
Experimental Investigations on Material Removal Rate and Surface Roughness in Lapping of Substrate Wafers: A Literature Review
Experimental Investigations on Material Removal Rate and Surface Roughness in Lapping of Substrate Wafers: A Literature Review
Cong, W.L. (author) / Zhang, P.F. (author) / Pei, Z.J. (author) / Xu, X.
2009-01-01
10 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Material Removal Model of Sapphire Substrate in Double-Side Lapping Process
British Library Online Contents | 2009
|Damage mechanisms during lapping and mechanical polishing CdZnTe wafers
British Library Online Contents | 2010
|Thinning of Lithium Niobate Wafers with a Novel Designed Lapping Tool and Measurements
British Library Online Contents | 2010
|British Library Online Contents | 2011
|Development of Lapping and Polishing Technologies of 4H-SiC Wafers for Power Device Applications
British Library Online Contents | 2009
|