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Cesium redeposition artifacts during low energy ToF-SIMS depth profiling

Vitchev, R. G. / Brison, J. / Houssiau, L.

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Cesium redeposition artifacts during low energy ToF-SIMS depth profiling

Vitchev, R. G. / Brison, J. / Houssiau, L.

Cesium redeposition artifacts during low energy ToF-SIMS depth profiling

Vitchev, R. G. / Brison, J. / Houssiau, L.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Cesium redeposition artifacts during low energy ToF-SIMS depth profiling

Contributors:

Vitchev, R. G. (author) / Brison, J. (author) / Houssiau, L. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 7586-7589

Publication date:

2009-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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