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    Optimization of Si interface control layer thickness for high-k GaAs metal-insulator-semiconductor structures

    New search for: Akazawa, M.
    New search for: Hasegawa, H.

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    Optimization of Si interface control layer thickness for high-k GaAs metal-insulator-semiconductor structures

    New search for: Akazawa, M.
    New search for: Hasegawa, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Optimization of Si interface control layer thickness for high-k GaAs metal-insulator-semiconductor structures

    New search for: Akazawa, M.
    New search for: Hasegawa, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Title:

    Optimization of Si interface control layer thickness for high-k GaAs metal-insulator-semiconductor structures

    Contributors:

    Akazawa, M. (author) / Hasegawa, H. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 165 ; 122-125

    Publication date:

    2009-01-01

    Size:

    4 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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