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Lateral growth of monocrystalline Ge on silicon oxide by ultrahigh vacuum chemical vapor deposition
Lateral growth of monocrystalline Ge on silicon oxide by ultrahigh vacuum chemical vapor deposition
Lateral growth of monocrystalline Ge on silicon oxide by ultrahigh vacuum chemical vapor deposition
Cammilleri, V.D. (author) / Yam, V. (author) / Fossard, F. (author) / Renard, C. (author) / Bouchier, D. (author) / Zheng, Y. (author) / Fazzini, P.F. (author) / Houdellier, F. (author) / Hytch, M. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 11 ; 214-216
2008-01-01
3 pages
Article (Journal)
English
DDC:
621.38152
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