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Growth of Ge on Silicon by Ultrahigh Vacuum Chemical Vapor Deposition

Cheng, B.-w. / Xue, C.-l. / Luo, L.-p. / Han, G.-q. / Zeng, Y.-g. / Xue, H.-y. / Wang, Q.-m.

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Growth of Ge on Silicon by Ultrahigh Vacuum Chemical Vapor Deposition

Cheng, B.-w. / Xue, C.-l. / Luo, L.-p. / Han, G.-q. / Zeng, Y.-g. / Xue, H.-y. / Wang, Q.-m.

Growth of Ge on Silicon by Ultrahigh Vacuum Chemical Vapor Deposition

Cheng, B.-w. / Xue, C.-l. / Luo, L.-p. / Han, G.-q. / Zeng, Y.-g. / Xue, H.-y. / Wang, Q.-m.

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Title:

Growth of Ge on Silicon by Ultrahigh Vacuum Chemical Vapor Deposition

Contributors:

Cheng, B.-w. (author) / Xue, C.-l. (author) / Luo, L.-p. (author) / Han, G.-q. (author) / Zeng, Y.-g. (author) / Xue, H.-y. (author) / Wang, Q.-m. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 27 ; 118-120

Publication date:

2009-01-01

Size:

3 pages

ISSN:

1673-2812

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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