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Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics
Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics
Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics
He, B. C. (author) / Wen, H. C. (author) / Chinag, T. Y. (author) / Chang, Z. C. (author) / Lian, D. (author) / Yau, W. H. (author) / Wu, W. F. (author) / Chou, C. P. (author)
APPLIED SURFACE SCIENCE ; 256 ; 3299-3302
2010-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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