Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum: Fid-Bau Portal

Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum

Hattori, A. N. / Endo, K. / Hattori, K. / Daimon, H.

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Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum

Hattori, A. N. / Endo, K. / Hattori, K. / Daimon, H.

Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum

Hattori, A. N. / Endo, K. / Hattori, K. / Daimon, H.

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Check availability in my library

Order at Subito €

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Document information

Title:

Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum

Contributors:

Hattori, A. N. (author) / Endo, K. (author) / Hattori, K. (author) / Daimon, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 256 ; 4745-4756

Publication date:

2010-01-01

Size:

12 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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