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    Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures

    New search for: Kobayashi, H.
    New search for: Imamura, K.
    New search for: Kim, W. B.
    New search for: Im, S. S.

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    Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures

    New search for: Kobayashi, H.
    New search for: Imamura, K.
    New search for: Kim, W. B.
    New search for: Im, S. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures

    New search for: Kobayashi, H.
    New search for: Imamura, K.
    New search for: Kim, W. B.
    New search for: Im, S. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures

    Contributors:

    Kobayashi, H. (author) / Imamura, K. (author) / Kim, W. B. (author) / Im, S. S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 5744-5756

    Publication date:

    2010-01-01

    Size:

    13 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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