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Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

Alekhin, A. P. / Gudkova, S. A. / Markeev, A. M. / Mitiaev, A. S. / Sigarev, A. A. / Toknova, V. F.

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Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

Alekhin, A. P. / Gudkova, S. A. / Markeev, A. M. / Mitiaev, A. S. / Sigarev, A. A. / Toknova, V. F.

Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

Alekhin, A. P. / Gudkova, S. A. / Markeev, A. M. / Mitiaev, A. S. / Sigarev, A. A. / Toknova, V. F.

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Check availability in my library

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Document information

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Document information

Title:

Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

Contributors:

Alekhin, A. P. (author) / Gudkova, S. A. (author) / Markeev, A. M. (author) / Mitiaev, A. S. (author) / Sigarev, A. A. (author) / Toknova, V. F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 186-191

Publication date:

2010-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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