Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Aarik, J. / Aidla, A. / Kasikov, A. et al. | British Library Online Contents | 2006

Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

Mitchell, D. R. / Aidla, A. / Aarik, J. | British Library Online Contents | 2006

Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition

Chesnokov, Y. M. / Miakonkikh, A. V. / Rogozhin, A. E. et al. | British Library Online Contents | 2018

Layer structure variations of ultra-thin HfO2 films induced by post-deposition annealing

Fu, W. E. / Chang, Y. Q. | British Library Online Contents | 2011