Dependence of Microstructural Evolution of Nanoindented Cu/Si Thin Films on Annealing Temperature: Fid-Bau Portal

Dependence of Microstructural Evolution of Nanoindented Cu/Si Thin Films on Annealing Temperature

Lee, W.-S. / Chen, T.-H. / Lin, C.-F. / Chuang, Y.-L.

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Dependence of Microstructural Evolution of Nanoindented Cu/Si Thin Films on Annealing Temperature

Lee, W.-S. / Chen, T.-H. / Lin, C.-F. / Chuang, Y.-L.

Dependence of Microstructural Evolution of Nanoindented Cu/Si Thin Films on Annealing Temperature

Lee, W.-S. / Chen, T.-H. / Lin, C.-F. / Chuang, Y.-L.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Dependence of Microstructural Evolution of Nanoindented Cu/Si Thin Films on Annealing Temperature

Contributors:

Lee, W.-S. (author) / Chen, T.-H. (author) / Lin, C.-F. (author) / Chuang, Y.-L. (author)

Published in:

MATERIALS TRANSACTIONS ; 51 ; 2013-2018

Publication date:

2010-01-01

Size:

6 pages

ISSN:

1345-9678

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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