Interfacial reaction and electrical characteristics of Cu(RuTaNx) on GaAs: Annealing effects: Fid-Bau Portal

Interfacial reaction and electrical characteristics of Cu(RuTaNx) on GaAs: Annealing effects

Leau, W. K. / Chu, J. P. / Lin, C. H.

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Interfacial reaction and electrical characteristics of Cu(RuTaNx) on GaAs: Annealing effects

Leau, W. K. / Chu, J. P. / Lin, C. H.

Interfacial reaction and electrical characteristics of Cu(RuTaNx) on GaAs: Annealing effects

Leau, W. K. / Chu, J. P. / Lin, C. H.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Interfacial reaction and electrical characteristics of Cu(RuTaNx) on GaAs: Annealing effects

Contributors:

Leau, W. K. (author) / Chu, J. P. (author) / Lin, C. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 7286-7290

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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