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The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering
The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering
The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering
Lu, W.M. (author) / Zhang, J. (author) / Diao, H.W. (author) / Zhao, L. (author) / Wang, W.J. (author) / Gao, K. / Zhou, S. / Zhao, X.
2011-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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