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The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering

Lu, W.M. / Zhang, J. / Diao, H.W. / Zhao, L. / Wang, W.J.

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The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering

Lu, W.M. / Zhang, J. / Diao, H.W. / Zhao, L. / Wang, W.J.

The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering

Lu, W.M. / Zhang, J. / Diao, H.W. / Zhao, L. / Wang, W.J.

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Bestellung bei Subito €

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Ähnliche Titel

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Titel:

The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering

Beteiligte:

Lu, W.M. (Autor:in) / Zhang, J. (Autor:in) / Diao, H.W. (Autor:in) / Zhao, L. (Autor:in) / Wang, W.J. (Autor:in) / Gao, K. / Zhou, S. / Zhao, X.

Erschienen in:

Energy, Environment and Biological Materials ; 134-140

MATERIALS SCIENCE FORUM ; 685

Erscheinungsdatum:

01.01.2011

Format / Umfang:

7 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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