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    Evolution of SiGe nanoclusters and micro defects in the Si1-xGex layer fabricated by two-step ion implantation and subsequent thermal annealing

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    New search for: Tu, H.
    New search for: Xiao, Q.
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    New search for: Li, Z.
    New search for: Liu, D.

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    Evolution of SiGe nanoclusters and micro defects in the Si1-xGex layer fabricated by two-step ion implantation and subsequent thermal annealing

    New search for: Xu, W.
    New search for: Tu, H.
    New search for: Xiao, Q.
    New search for: Chang, Q.
    New search for: Li, Z.
    New search for: Liu, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Evolution of SiGe nanoclusters and micro defects in the Si1-xGex layer fabricated by two-step ion implantation and subsequent thermal annealing

    New search for: Xu, W.
    New search for: Tu, H.
    New search for: Xiao, Q.
    New search for: Chang, Q.
    New search for: Li, Z.
    New search for: Liu, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Evolution of SiGe nanoclusters and micro defects in the Si1-xGex layer fabricated by two-step ion implantation and subsequent thermal annealing

    Contributors:

    Xu, W. (author) / Tu, H. (author) / Xiao, Q. (author) / Chang, Q. (author) / Li, Z. (author) / Liu, D. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 9260-9263

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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