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Structural characterization of SiGe nanoclusters formed by rapid thermal annealing

dos Anjos, A. M. / Doi, I. / Diniz, J. A.

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Structural characterization of SiGe nanoclusters formed by rapid thermal annealing

dos Anjos, A. M. / Doi, I. / Diniz, J. A.

Structural characterization of SiGe nanoclusters formed by rapid thermal annealing

dos Anjos, A. M. / Doi, I. / Diniz, J. A.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

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Document information

Title:

Structural characterization of SiGe nanoclusters formed by rapid thermal annealing

Contributors:

dos Anjos, A. M. (author) / Doi, I. (author) / Diniz, J. A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 6055-6058

Publication date:

2008-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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