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Copper diffusion barrier performance of amorphous Ta-Ni thin films
Copper diffusion barrier performance of amorphous Ta-Ni thin films
Copper diffusion barrier performance of amorphous Ta-Ni thin films
Yan, H. (author) / Tay, Y. Y. (author) / Jiang, Y. (author) / Yantara, N. (author) / Pan, J. (author) / Liang, M. H. (author) / Chen, Z. (author)
APPLIED SURFACE SCIENCE ; 258 ; 3158-3162
2012-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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