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Formation of 12-nm Nanodot Pattern by Block Copolymer Self-Assembly Technique

Huda, M. / Tamura, T. / Yin, Y. / Hosaka, S.

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Formation of 12-nm Nanodot Pattern by Block Copolymer Self-Assembly Technique

Huda, M. / Tamura, T. / Yin, Y. / Hosaka, S.

Formation of 12-nm Nanodot Pattern by Block Copolymer Self-Assembly Technique

Huda, M. / Tamura, T. / Yin, Y. / Hosaka, S.

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Order at Subito €

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Document information

Title:

Formation of 12-nm Nanodot Pattern by Block Copolymer Self-Assembly Technique

Contributors:

Huda, M. (author) / Tamura, T. (author) / Yin, Y. (author) / Hosaka, S. (author) / Hanaizumi, O. / Unno, M. / Miura, K.

Published in:

Silicon Science and Advanced Micro-Device Engineering II ; 122-126

KEY ENGINEERING MATERIALS ; 497

Publication date:

2012-01-01

Size:

5 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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