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Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Akahane, T. / Komori, T. / Liu, J. / Huda, M. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

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Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Akahane, T. / Komori, T. / Liu, J. / Huda, M. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Akahane, T. / Komori, T. / Liu, J. / Huda, M. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

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Document information

Title:

Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Contributors:

Akahane, T. (author) / Komori, T. (author) / Liu, J. (author) / Huda, M. (author) / Mohamad, Z.B. (author) / Yin, Y. (author) / Hosaka, S. (author) / Hosaka, S.

Published in:

Advanced Micro-Device Engineering III ; 126-130

KEY ENGINEERING MATERIALS ; 534

Publication date:

2013-01-01

Size:

5 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Self-Assembled Nanodot Fabrication by Using Diblock Copolymer

Huda, M. / Yin, Y. / Hosaka, S. | British Library Online Contents | 2011

Metal nanodot array fabrication using self-assembled diblock copolymer

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Long-range-ordered Ag nanodot arrays grown on GaAs substrate using nanoporous alumina mask

Liu, W. / Wang, X. / Xu, R. et al. | British Library Online Contents | 2013