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Enthalpy based modeling of pulsed excimer laser annealing for process simulation

Hackenberg, M. / Pichler, P. / Huet, K. / Negru, R. / Venturini, J. / Pakfar, A. / Tavernier, C. / La Magna, A.

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Enthalpy based modeling of pulsed excimer laser annealing for process simulation

Hackenberg, M. / Pichler, P. / Huet, K. / Negru, R. / Venturini, J. / Pakfar, A. / Tavernier, C. / La Magna, A.

Enthalpy based modeling of pulsed excimer laser annealing for process simulation

Hackenberg, M. / Pichler, P. / Huet, K. / Negru, R. / Venturini, J. / Pakfar, A. / Tavernier, C. / La Magna, A.

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Check availability in my library

Order at Subito €

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Document information

Title:

Enthalpy based modeling of pulsed excimer laser annealing for process simulation

Contributors:

Hackenberg, M. (author) / Pichler, P. (author) / Huet, K. (author) / Negru, R. (author) / Venturini, J. (author) / Pakfar, A. (author) / Tavernier, C. (author) / La Magna, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 9347-9351

Publication date:

2012-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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